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Proceedings Paper

High refractive index immersion fluids for 193 nm immersion lithography
Author(s): Bridgette Budhlall; Gene Parris; Peng Zhang; Xiaoping Gao; Zarka Zarkov; Brenda Ross; Simon Kaplan; John Burnett
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Paper Abstract

For the next-generation immersion lithography technology, there is a growing interest in the immersion fluids having a refractive index larger than 1.5 and low absorbance at 193nm wavelength. In this paper, we report our effort in identifying new immersion fluid candidates. The absolute refractive index values and thermo-optic coefficients, dn/dT, were measured with 1x10-4 and 1x10-5 accuracy respectively at 193nm wavelength. The results showed promising candidates having refractive index ranging from 1.5 to 1.65 with low absorbance at 193nm wavelength. Preliminary imaging results with a new immersion fluid gave good 65nm Line/Space patterns. However, the minimum exposure time of 20sec is about ten times as needed for water, indicating the need to further reduce the absorbance of the immersion fluid.

Paper Details

Date Published: 12 May 2004
PDF: 8 pages
Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2004); doi: 10.1117/12.600025
Show Author Affiliations
Bridgette Budhlall, Air Products and Chemicals, Inc. (United States)
Gene Parris, Air Products and Chemicals, Inc. (United States)
Peng Zhang, Air Products and Chemicals, Inc. (United States)
Xiaoping Gao, Air Products and Chemicals, Inc. (United States)
Zarka Zarkov, Air Products and Chemicals, Inc. (United States)
Brenda Ross, Air Products and Chemicals, Inc. (United States)
Simon Kaplan, National Institute of Standards and Technology (United States)
John Burnett, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 5754:
Optical Microlithography XVIII
Bruce W. Smith, Editor(s)

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