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Proceedings Paper

Plasma pinch EUV source with particle injection
Author(s): Malcolm W. McGeoch
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Paper Abstract

Pinch discharge EUV sources tend to produce 13.5nm radiation from an elongated plasma, decreasing the possible collection efficiency for the lowest etendue collector designs. As a means to concentrate EUV emission we have investigated particle injection to locate the radiating species in a small volume at the center of the pinch. We have considered theoretically the rate of ionization and expansion of a small tin droplet in a buffer gas pinch plasma of argon or helium. The particle becomes negatively charged, with consequences for the electron and ion heat fluxes onto its surface. Photo-emission can reduce this negative potential and enhance the electron heat flux. We estimate that the 30 μm diameter tin particle that contains the minimum, or 'mass limited' number of atoms for a 5J EUV-emitting plasma, will fully ionize in less than 100nsec in a typical Star Pinch [1] plasma at the relevant electron density of 2x1019 cm-3 and temperature of 30eV. We report on the generation of high velocity, on-demand, accurately positioned tin droplets suitable for the injection pinch, and on limitations to the system reliability.

Paper Details

Date Published: 6 May 2005
PDF: 7 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.599980
Show Author Affiliations
Malcolm W. McGeoch, PLEX LLC (United States)

Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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