Share Email Print
cover

Proceedings Paper

UIUC collector erosion and optical lifetime project results: time dependent exposures
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Extreme ultraviolet (EUV) light sources are needed for next-generation lithography. A critical consideration in the development of such a source is the lifetime of collector optics. Frequent replacement of the mirror system will detract from the economic feasibility of EUV lithography. The Xtreme Commercial EUV Exposure Device (XCEED) at the University of Illinois has been designed to test the performance of various EUV mirror materials during operation of a commercial EUV source, and to investigate the mechanisms behind observed losses in reflectivity over a varying number of shots. Recently, four Mo/Si multilayer mirror samples were exposed in XCEED for variable numbers of shots, up to 40 million. The samples were analyzed to determine how the surface roughness was effected and how much material was eroded vs. time. XCEED also includes photodiodes to measure light output and light reflected from mirror samples, as well as a time-of-flight energy sector analyzer (TOF-ESA) for debris characterization. The results of these time-dependent exposures are presented in this work.

Paper Details

Date Published: 6 May 2005
PDF: 7 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.599978
Show Author Affiliations
Darren A. Alman, Univ. of Illinois at Urbana-Champaign (United States)
Huatan Qiu, Univ. of Illinois at Urbana-Champaign (United States)
Keith C. Thompson, Univ. of Illinois at Urbana-Champaign (United States)
Erik L. Antonsen, Univ. of Illinois at Urbana-Champaign (United States)
Joshua B. Spencer, Univ. of Illinois at Urbana-Champaign (United States)
Matthew R. Hendricks, Univ. of Illinois at Urbana-Champaign (United States)
Brian E. Jurczyk, Univ. of Illinois at Urbana-Champaign (United States)
David N. Ruzic, Univ. of Illinois at Urbana-Champaign (United States)
Timothy Spila, Univ. of Illinois at Urbana-Champaign (United States)
Ginger Edwards, SEMATECH (United States)
Stefan Wurm, SEMATECH (United States)
Obert Wood, SEMATECH (United States)
Robert Bristol, Intel Corp. (United States)


Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

© SPIE. Terms of Use
Back to Top