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Proceedings Paper

Development of laser deposition package for modeling of EUV sources for microlithography
Author(s): Volodymyr Makhin; Bruno S. Bauer; Irvin R. Lindemuth; Bryan J. Rice
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Paper Abstract

A laser energy deposition model has been incorporated into the MHRDR-EUVL magnetohydrodynamic (MHD) model of EUV sources for microlithography. The model includes inverse-bremsstrahlung absorption, resonance absorption, and reflection of laser radiation from the plasma critical surface. The plasma evolution is simulated in parallel with the MHRDR-EUVL (Magneto-Hydro-Radiative-Dynamic-Research) 2D, three-temperature, MHD computer code. Convenient user-options include simple specification of the full width at half maximum (FWHM) of typical laser profiles, such as Gaussian profiles in space and time. The new laser deposition capability will allow MHRDR-EUVL to calculate the evolution of magnetized laser-produced plasmas. Magnetic fields can reduce the loss of plasma energy caused by plasma expansion and thermal conductivity.

Paper Details

Date Published: 6 May 2005
PDF: 12 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.599942
Show Author Affiliations
Volodymyr Makhin, Univ. of Nevada/Reno (United States)
Bruno S. Bauer, Univ. of Nevada/Reno (United States)
Irvin R. Lindemuth, Univ. of Nevada/Reno (United States)
Bryan J. Rice, Intel Corp. (United States)


Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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