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Proceedings Paper

S-FIL technology: cost of ownership case study
Author(s): Sunil Murthy; Michael Falcon; S. V. Sreenivasan; Daren Dance
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Paper Abstract

The escalating costs of lithography for the sub 90nm regime have been well documented. The semiconductor industry is exploring evolutionary improvements to existing photolithographic techniques as well as disruptive, but cost effective patterning technologies for the demanding high-resolution requirements. Step and Flash Imprint Lithography (S-FIL) is an innovative patterning technology commercialized by Molecular Imprints. S-FIL has demonstrated the capability to pattern very high-resolution features and has been recognized as an NGL candidate by inclusion on the ITRS Roadmap in December 2003. This paper describes the S-FIL process and examines its comparative cost of ownership relative to conventional photolithography at the 90nm node and to immersion photolithography at the 65nm node for patterning contacts and dual damascene.

Paper Details

Date Published: 6 May 2005
PDF: 12 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.599921
Show Author Affiliations
Sunil Murthy, Molecular Imprints Inc. (United States)
Michael Falcon, Molecular Imprints Inc. (United States)
S. V. Sreenivasan, Molecular Imprints Inc. (United States)
Daren Dance, Wright Williams & Kelly, Inc. (United States)


Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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