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Proceedings Paper

How to describe polarization influence on imaging
Author(s): M. Totzeck; P. Graupner; T. Heil; A. Gohnermeier; O. Dittmann; D. Krahmer; V. Kamenov; J. Ruoff; D. Flagello
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Paper Abstract

We give a general introduction into polarized imaging and report on a Jones-pupil approach for a complete evaluation of the resulting optical performance. The Jones pupil assigns a Jones matrix to each point of the exit pupil describing the impact of both the global phase and the polarization on imaging. While we can learn already a lot about the optical system by taking a close look at the Jones pupil - and starting imaging simulations from it - a quantitative assessment is necessary for a complete evaluation of imaging. To do this, we generalize the concept of scalar Zernike aberrations to Jones-Zernike aberrations by expansion of the Jones pupil into vector polynomials. The resulting method is non-paraxial, i.e. the effect of the polarization dependent contrast loss for high numerical apertures is included. The aberrations of the Jones-matrix pupil are a suitable tool to identify the main drivers determining the polarization performance. Furthermore, they enable us to compare the polarized and the unpolarized performance of the such characterized lithographic system.

Paper Details

Date Published: 12 May 2004
PDF: 15 pages
Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2004); doi: 10.1117/12.599908
Show Author Affiliations
M. Totzeck, Carl Zeiss SMT AG (Germany)
P. Graupner, Carl Zeiss SMT AG (Germany)
T. Heil, Carl Zeiss SMT AG (Germany)
A. Gohnermeier, Carl Zeiss SMT AG (Germany)
O. Dittmann, Carl Zeiss SMT AG (Germany)
D. Krahmer, Carl Zeiss SMT AG (Germany)
V. Kamenov, Carl Zeiss SMT AG (Germany)
J. Ruoff, Carl Zeiss (Germany)
D. Flagello, ASML US, Inc. (United States)


Published in SPIE Proceedings Vol. 5754:
Optical Microlithography XVIII
Bruce W. Smith, Editor(s)

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