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Proceedings Paper

The problem of optimal placement of sub-resolution assist features (SRAF)
Author(s): Maharaj Mukherjee; Scott Mansfield; Lars Liebmann; Alexey Lvov; Evanthia Papadapoulou; Mark Lavin; Zengqin Zhao
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Paper Abstract

In this paper, we present a formulation of the Sub-Resolution Assist Feature (SRAF) placement problem as a geometric optimization problem. We present three independent geometric methodologies that use the above formulation to optimize SRAF placements under mask and lithographic process constraints. Traditional rules-based methodology, are mainly one dimensional in nature. These methods, though apparently very simple, has proven to be inadequate for complex two-dimensional layouts. The methodologies presented in this paper, on the other hand, are inherently two-dimensional and attempt to maximize SRAF coverage on real and complex designs, and minimizes mask rule and lithographic violations.

Paper Details

Date Published: 12 May 2004
PDF: 13 pages
Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2004); doi: 10.1117/12.599884
Show Author Affiliations
Maharaj Mukherjee, IBM Microelectronics Div. (United States)
Scott Mansfield, IBM Microelectronics Div. (United States)
Lars Liebmann, IBM Microelectronics Div. (United States)
Alexey Lvov, IBM Research Div. (United States)
Evanthia Papadapoulou, IBM Research Div. (United States)
Mark Lavin, IBM Research Div. (United States)
Zengqin Zhao, IBM Microelectronics Div. (United States)

Published in SPIE Proceedings Vol. 5754:
Optical Microlithography XVIII
Bruce W. Smith, Editor(s)

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