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Proceedings Paper

Removal of low concentrations of acid gases: issues and solutions
Author(s): Andrew J. Dallas; Lefei Ding; Jeremy Exley; Jon Joriman; Brian Hoang; Jonathan Parsons; Kevin Seguin; Dustin Zastera
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Paper Abstract

Part per billion concentrations of acid gases such as SOx and NOx have been detected in both high purity gases and CDA lines. These contaminants can have deleterious effects on a number of high purity applications such as the optics found in lithography equipment steppers, scanners, and inspection tools. In addition, acidic gases have also been shown to reduce the life of masks and reticles, decrease fuel cell output due to catalyst poisoning, and cause hard disk drive crashes due to surface contamination and corrosion. Consequently, acid gas control in these applications has become a critical part of the required filtration system. SOx concentrations are typically used as the baseline for acid gas filter exposure guidelines and performance testing. However, this approach has been shown to provide poor filter life predictions, which has been attributed to the presence of other acidic and organic contaminants that compete with SOx for the available adsorption sites. Equally important, the type of sorbents and methods used to control acid gases can significantly affect the ability to remove SOx. In this work we will compare the performance of various sorbents, structures, and methods for the removal of SOx and NOx.

Paper Details

Date Published: 10 May 2005
PDF: 12 pages
Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); doi: 10.1117/12.599815
Show Author Affiliations
Andrew J. Dallas, Donaldson Co., Inc. (United States)
Lefei Ding, Donaldson Co., Inc. (United States)
Jeremy Exley, Donaldson Co., Inc. (United States)
Jon Joriman, Donaldson Co., Inc. (United States)
Brian Hoang, Donaldson Co., Inc. (United States)
Jonathan Parsons, Donaldson Co., Inc. (United States)
Kevin Seguin, Donaldson Co., Inc. (United States)
Dustin Zastera, Donaldson Co., Inc. (United States)


Published in SPIE Proceedings Vol. 5752:
Metrology, Inspection, and Process Control for Microlithography XIX
Richard M. Silver, Editor(s)

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