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Proceedings Paper

Optical metrology of patterned magnetic structures: deep versus shallow gratings
Author(s): Roman Antos; Martin Veis; Eva Liskova; Mitsuru Aoyama; Jaroslav Hamrle; Takashi Kimura; Pavol Gustafik; Masahiro Horie; Jan Mistrik; Tomuo Yamaguchi; Stefan Visnovsky; Naomichi Okamoto
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Paper Abstract

Spectroscopic ellipsometry (SE) and magneto-optical (MO) spectroscopy are applied to analyze three sets of shallow magnetic gratings. The experimental data of SE are used to extract geometrical parameters of several samples. A half-micrometer thick transparent interlayer present between the periodic magnetic wires and the substrate in one of the sets of the samples is used to increase the sensitivity of SE and MO measurements. Thanks to this sensitivity the geometrical parameters can be extracted together with the material composition of the magnetic film. In order to interpret the magneto-optical Kerr effect (MOKE) measurement, three theoretical approaches are used in the simulations, the rigorous coupled-wave method (CWM), the local mode method (LMM), and a new approach based on comparing CWM with LMM with defining a 'quality factor' of the grating with respect to the wire edges. Using the MOKE spectra in the 0th and -1st diffraction orders, one set of the samples made with a protection capping is analyzed with respect to the native-oxidation process. The quality factor of these samples is extracted from MOKE in the -1st diffraction order for p-polarized incidence. The monitoring system based on both SE and MOKE is rated as highly sensitive and precise, and with accurate determination of the optical and magneto-optical constants it could by applied in multi-parameter fitting.

Paper Details

Date Published: 10 May 2005
PDF: 10 pages
Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); doi: 10.1117/12.599653
Show Author Affiliations
Roman Antos, Shizuoka Univ. (Japan)
Martin Veis, Charles Univ. (Czech Republic)
Eva Liskova, Charles Univ. (Czech Republic)
Mitsuru Aoyama, Shizuoka Univ. (Japan)
Jaroslav Hamrle, Frontier Research System, RIKEN (Japan)
Takashi Kimura, Frontier Research System, RIKEN (Japan)
Pavol Gustafik, Shizuoka Univ. (Japan)
Masahiro Horie, Dainippon Screen Manufacturing Co., Ltd. (Japan)
Jan Mistrik, Shizuoka Univ. (Japan)
Tomuo Yamaguchi, Shizuoka Univ. (Japan)
Stefan Visnovsky, Shizuoka Univ. (Japan)
Charles Univ. (Czech Republic)
Naomichi Okamoto, Shizuoka Univ. (Japan)


Published in SPIE Proceedings Vol. 5752:
Metrology, Inspection, and Process Control for Microlithography XIX
Richard M. Silver, Editor(s)

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