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Proceedings Paper

Arrayed microcolumns for high throughput lithography
Author(s): Ho Seob Kim; Dae-Wook Kim; Seung Joon Ahn; Young Chul Kim; Yong Jang; Hyeng Woo Kim; Sang Kook Choi; Dae Yong Kim
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Paper Abstract

The small size of the microcolumn opens the possibility for arrayed operation on a scale commensurate. An arrayed microcolumn test-bed system has been developed for high throughput applications. The arrayed microcolumns based on of Single Column Module (SCM), and Wafer-Scale Column Module (WCM) concepts have been fabricated and successfully demonstrated. Low energy microcolumn lithography has been operated in the energy range from 100 eV to 1 keV for the generation of nano patterns. Probe beam current at the sample was measured about 2 nA at a total beam current of ~0.4 mA. The magnitude of probe beam current is strong enough for the low energy lithography. The thin layers of PMMA resist have been employed. The results of nano-patterning by low energy microcolumn lithography will be discussed.

Paper Details

Date Published: 6 May 2005
PDF: 9 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.599575
Show Author Affiliations
Ho Seob Kim, Sun Moon Univ. (South Korea)
Dae-Wook Kim, Sun Moon Univ. (South Korea)
Seung Joon Ahn, Sun Moon Univ. (South Korea)
Young Chul Kim, Sun Moon Univ. (South Korea)
Yong Jang, Sun Moon Univ. (South Korea)
Hyeng Woo Kim, Sun Moon Univ. (South Korea)
Sang Kook Choi, Electronics and Telecommuncations Research Institute (South Korea)
Dae Yong Kim, Electronics and Telecommuncations Research Institute (South Korea)


Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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