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Proceedings Paper

Photoresists for CO2-based next-generation microlithography
Author(s): Mary Kate Boggiano; Colin Wood; Joseph M. DeSimone
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Paper Abstract

Two routes have been pursued toward the fabrication of photoresists for next-generation microlithography, using condensed carbon dioxide as the processing solvent. Addition polymers containing a norbornyl backbone were synthesized to include fluorinated moieties and chemical amplification switching groups. Other polymers, synthesized free radically in condensed CO2, include partially fluorinated backbones. These materials have been characterized and their lithographic properties evaluated. Solubility differences between exposed and non-exposed resist have been observed in these novel systems, which should provide the necessary contrast for high-resolution imaging.

Paper Details

Date Published: 4 May 2005
PDF: 4 pages
Proc. SPIE 5753, Advances in Resist Technology and Processing XXII, (4 May 2005); doi: 10.1117/12.599565
Show Author Affiliations
Mary Kate Boggiano, Univ. of North Carolina at Chapel Hill (United States)
Colin Wood, Univ. of North Carolina at Chapel Hill (United States)
Joseph M. DeSimone, Univ. of North Carolina at Chapel Hill (United States)
North Carolina State Univ./Raleigh (United States)


Published in SPIE Proceedings Vol. 5753:
Advances in Resist Technology and Processing XXII
John L. Sturtevant, Editor(s)

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