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Proceedings Paper

Simple microscale selective patterning on a single nanowire by using an optical microscope
Author(s): Dong Jin Oh; Boone Won; Kang Hyun Kim; Gyu Tae Kim
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Paper Abstract

A simple convenient way of forming a selective patterning on a single nanowire was demonstrated by using a conventional optical microscope. The fine resolution could reach approximately 5μm, which is enough to define electrode patterns on a single nanowire in a two-probe configuration. The photolithographic processes were carried out under the microscope with photoresist-coated substrate deposited by nanowires. Through the image capture and a proper configuration of the various home-made photomasks could produce a selective patterning on an individual nanowire successfully. Current-voltage characteristics of an individual GaN single nanowire were measured as a demonstration.

Paper Details

Date Published: 12 May 2004
PDF: 8 pages
Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2004); doi: 10.1117/12.599540
Show Author Affiliations
Dong Jin Oh, Korea Univ. Anam-dong (South Korea)
Boone Won, Korea Univ. Anam-dong (South Korea)
Kang Hyun Kim, Korea Univ. Anam-dong (South Korea)
Gyu Tae Kim, Korea Univ. Anam-dong (South Korea)


Published in SPIE Proceedings Vol. 5754:
Optical Microlithography XVIII
Bruce W. Smith, Editor(s)

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