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Proceedings Paper

Preliminary study on systematic optimization of EPL mask infrastructure
Author(s): Nobuyuki Iriki; Jiro Yamamoto; Hiroshi Arimoto
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Paper Abstract

Electron projection lithography (EPL) has high-resolution capability of meeting the 65 nm technology node and beyond. A first-generation EPL has been developed and improved at Nikon and Selete. Defect free mask is indispensable for successful introduction of this technology into the production stage. However, an EPL mask is considerably different from today's optical photomask, especially due to its 3-D structure. Hence the conventional methods of quality assurance used for optical photomask are not applicable for EPL mask. Selete is now developing a series of defect inspection and repair systems for an EPL stencil mask infrastructure. In our previous work we reported on the individual systems for defect inspection and mask repair by using programmed defects. Moreover, we verified a number of the defect inspection and repair systems through a sequential process. In this work the motivation is to investigate relationship issues among these tools for future applications, such as defect printability, CD controllability, calibration, optimization, performance matching, and automated operation.

Paper Details

Date Published: 6 May 2005
PDF: 9 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.599533
Show Author Affiliations
Nobuyuki Iriki, Semiconductor Leading Edge Technologies, Inc. (Japan)
Jiro Yamamoto, Hitachi, Ltd. (Japan)
Hiroshi Arimoto, Semiconductor Leading Edge Technologies, Inc. (Japan)

Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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