Share Email Print
cover

Proceedings Paper

Double-grating lateral shearing interferometer for EUV optics at-wavelength measurement
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

A Calibration technology for double-grating lateral shearing interferometer1 (DLSI) and lateral shearing interferometer (LSI) is proposed in this paper. In this method, two measurements are used for calibration. One is the measurement by using the first- and zero-order diffraction beams of grating in the interferometer; the other one is the measurement by using the minus-first-order and zero-order diffraction beams. The phase distributions were calculated out from the two measurements. After shifted one phase distribution to superpose the other one, in the sum of the two phase distributions, the test wavefront is canceled. The system error caused by the grating diffraction and grating tilt can be calculated out from the sum of the superposed phase distributions. For calculating out the system errors, the sum of the two phase distributions is fitted to Zernike-Polynomials. From the coefficients of the Zernike-polynomials, the system error is calculated. This method is carried out to calibrate the system error of DLSI. We performed an experiment to verify the available of our calibration method.

Paper Details

Date Published: 10 May 2005
PDF: 10 pages
Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); doi: 10.1117/12.599456
Show Author Affiliations
Zhiqiang Liu, Extreme Ultraviolet Lithography System Development Association (Japan)
Masashi Okada, Extreme Ultraviolet Lithography System Development Association (Japan)
Katsumi Sugisaki, Extreme Ultraviolet Lithography System Development Association (Japan)
Mikihiko Ishii, Extreme Ultraviolet Lithography System Development Association (Japan)
Yucong Zhu, Extreme Ultraviolet Lithography System Development Association (Japan)
Katsura Ohtaki, Extreme Ultraviolet Lithography System Development Association (Japan)
Jun Saito, Extreme Ultraviolet Lithography System Development Association (Japan)
Akiyoshi Suzuki, Extreme Ultraviolet Lithography System Development Association (Japan)
Masanobu Hasegawa, Extreme Ultraviolet Lithography System Development Association (Japan)
Chidane Ouchi, Extreme Ultraviolet Lithography System Development Association (Japan)
Seima Kato, Extreme Ultraviolet Lithography System Development Association (Japan)
Masahito Niibe, Univ. of Hyogo (Japan)
Katsuhiko Murakami, Extreme Ultraviolet Lithography System Development Association (Japan)


Published in SPIE Proceedings Vol. 5752:
Metrology, Inspection, and Process Control for Microlithography XIX
Richard M. Silver, Editor(s)

© SPIE. Terms of Use
Back to Top