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Proceedings Paper

In field overlay uncertainty contributors
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Paper Abstract

In this publication, the contributors to in-field overlay metrology uncertainty have been parsed and quantified in a specific case study. Particular focus is placed on the unmodeled systematics, i.e. the components which contribute to residuals in a linear model after removal of random errors. These are the contributors which are often the most challenging to quantify and are suspected to be significant in the model residuals. The results show that even in a relatively "clean" front end process, the unmodeled systematics are the dominant residual contributor, accounting for 60 to 70% of the variance. Given the above results, new sampling and modeling methods are proposed which have the potential to improve the accuracy of modeled correctibles and lot dispositioning parameters.

Paper Details

Date Published: 10 May 2005
PDF: 8 pages
Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); doi: 10.1117/12.599397
Show Author Affiliations
Aviv Frommer, KLA-Tencor Corp. (Israel)
Elyakim Kassel, KLA-Tencor Corp. (Israel)
Pavel Izikson, KLA-Tencor Corp. (Israel)
Mike Adel, KLA-Tencor Corp. (Israel)
Philippe Leray, IMEC (Belgium)
Bernd Schulz, AMD Saxony LLC & Co. KG. (Germany)


Published in SPIE Proceedings Vol. 5752:
Metrology, Inspection, and Process Control for Microlithography XIX
Richard M. Silver, Editor(s)

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