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Proceedings Paper

Development of polarized-light illuminator and its impact
Author(s): Hisashi Nishinaga; Noriaki Tokuda; Soichi Owa; Shigeru Hirukawa; Osamu Tanitsu; Takehito Kudo; Hirohisa Tanaka
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Paper Abstract

Nikon has developed an illuminator with special options for RET (Resolution Enhancement Technique). For one of the solutions of RET, Nikon has pursued the development of a loss-less polarized illumination system. When the polarization direction is the same as the direction of the printed pattern, this technique improves image contrast and extends the process margin. We have simulated the impact of the RET with polarized illumination, in the case of dipole illumination and phase-shift masks, and we have estimated the dominant parameters for high performance polarized illumination. In addition, we have constructed a polarized-light illuminator and installed it in an ArF full-field scanner. We have measured and optimized the degree and distribution of polarization at the wafer plane with a special tool, and we have investigated image performance with polarized dipole illumination. Results show that the new polarized-light illuminator has extended the process margin, especially with respect to dose latitude. The results of the image simulations and experiments will be reported.

Paper Details

Date Published: 12 May 2004
PDF: 12 pages
Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2004); doi: 10.1117/12.599356
Show Author Affiliations
Hisashi Nishinaga, Nikon Corp. (Japan)
Noriaki Tokuda, Nikon Corp. (Japan)
Soichi Owa, Nikon Corp. (Japan)
Shigeru Hirukawa, Nikon Corp. (Japan)
Osamu Tanitsu, Nikon Corp. (Japan)
Takehito Kudo, Nikon Corp. (Japan)
Hirohisa Tanaka, Nikon Corp. (Japan)


Published in SPIE Proceedings Vol. 5754:
Optical Microlithography XVIII
Bruce W. Smith, Editor(s)

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