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Proceedings Paper

The influence of polymer structure on the litho- pattern profile in chemically amplified KrF photoresist
Author(s): Seok Han; Sangwoong Yoon; Tae-Young Kim; Myung Sun Kim; Young Ho Kim; Sang Mun Chon; Daisuke Shimizu; Kouichirou Yoshida; Yoshikazu Yamaguchi; Tsutomu Shimokawa
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Proc. SPIE 5753, Advances in Resist Technology and Processing XXII, ; doi: 10.1117/12.599337
Show Author Affiliations
Seok Han, Samsung Electronics Co., Ltd. (South Korea)
Sangwoong Yoon, Samsung Electronics Co., Ltd (South Korea)
Tae-Young Kim, Samsung Electronics Co., Ltd. (South Korea)
Myung Sun Kim, Samsung Electronics Co., Ltd. (South Korea)
Young Ho Kim, Samsung Electronics Co., Ltd. (South Korea)
Sang Mun Chon, Samsung Electronics Co., Ltd. (South Korea)
Daisuke Shimizu, JSR Corporation (Japan)
Kouichirou Yoshida, JSR Corporation (Japan)
Yoshikazu Yamaguchi, JSR Corporation (Japan)
Tsutomu Shimokawa, JSR Corporation (Japan)


Published in SPIE Proceedings Vol. 5753:
Advances in Resist Technology and Processing XXII
John L. Sturtevant, Editor(s)

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