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Proceedings Paper

Laser-produced-plasma light source for EUV lithography
Author(s): Georg Soumagne; Tamotsu Abe; Takashi Suganuma; Yousuke Imai; Hiroshi Someya; Hideo Hoshino; Masaki Nakano; Hiroshi Komori; Yuichi Takabayashi; Tatsuya Ariga; Yoshifumi Ueno; Yasunori Wada; Akira Endo; Koichi Toyoda
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Paper Abstract

The status of the next generation lithography laser produced plasma light source development at EUVA is presented. The light source is based on a Xenon jet target and a Nd:YAG driver laser. The laser, having a master oscillator power amplifier (MOPA) configuration, operates at 10 kHz repetition rate and generates an average output power of 1.5 kW. The fwhm pulsewidth is 6 ns. The EUV system currently delivers an average EUV source power of 9.1 W (2% bandwidth, 2π sr) with a conversion efficiency of 0.6 %. Based on the development it is concluded that solid-state Nd:YAG laser technology can be cost efficiently used to produce 10 W level EUV light sources. In order to generate an average power of 115 W for a future extreme ultraviolet (EUV) light source, however, the cost of a Nd:YAG based LPP source will be too high. Therefore RF-CO2 laser technology will be used. The designed CO2 driver laser system has a MOPA configuration. The oscillator has ns-order pulsewidth and the laser system operates at a repetition rate of 100 kHz. Due to its inert cleanliness Xenon droplets will be the target material.

Paper Details

Date Published: 6 May 2005
PDF: 7 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.599333
Show Author Affiliations
Georg Soumagne, Extreme Ultraviolet Lithography System Development Association (Japan)
Tamotsu Abe, Extreme Ultraviolet Lithography System Development Association (Japan)
Takashi Suganuma, Extreme Ultraviolet Lithography System Development Association (Japan)
Yousuke Imai, Extreme Ultraviolet Lithography System Development Association (Japan)
Hiroshi Someya, Extreme Ultraviolet Lithography System Development Association (Japan)
Hideo Hoshino, Extreme Ultraviolet Lithography System Development Association (Japan)
Masaki Nakano, Extreme Ultraviolet Lithography System Development Association (Japan)
Hiroshi Komori, Extreme Ultraviolet Lithography System Development Association (Japan)
Yuichi Takabayashi, Extreme Ultraviolet Lithography System Development Association (Japan)
Tatsuya Ariga, Extreme Ultraviolet Lithography System Development Association (Japan)
Yoshifumi Ueno, Extreme Ultraviolet Lithography System Development Association (Japan)
Yasunori Wada, Extreme Ultraviolet Lithography System Development Association (Japan)
Akira Endo, Extreme Ultraviolet Lithography System Development Association (Japan)
Koichi Toyoda, Extreme Ultraviolet Lithography System Development Association (Japan)


Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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