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Proceedings Paper

Kinetics of laser induced changes of characteristic optical properties in Lithosil with 193nm excimer laser exposure
Author(s): Ute Natura; Rolf Martin; Gordon von der Goenna; Michael Kahlke; Gabriele Fasold
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Paper Abstract

Fused silica is used as lens material in DUV microlithography systems. The kinetics of slow radiation induced defect generation in Lithosil® including absorption, hydrogen consumption and changes of the refractive index is described in detail and in very good agreement with measured data in previous papers. In addition to these effects after long time irradiation fused silica is characterized by rapid damage processes (RDP) after short time irradiation. A model describing the absorption of RDP in dependence on energy density, repetition rate and time is described in this paper, the sensitivity of RDP on pre-irradiation and illumination conditions is discussed. Furthermore a method to reduce energy dependent absorption of RDP is mentioned.

Paper Details

Date Published: 12 May 2004
PDF: 8 pages
Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2004); doi: 10.1117/12.599319
Show Author Affiliations
Ute Natura, SCHOTT Lithotec AG (Germany)
Rolf Martin, SCHOTT Lithotec AG (Germany)
Gordon von der Goenna, SCHOTT Lithotec AG (Germany)
Michael Kahlke, SCHOTT Lithotec AG (Germany)
Gabriele Fasold, SCHOTT Lithotec AG (Germany)


Published in SPIE Proceedings Vol. 5754:
Optical Microlithography XVIII
Bruce W. Smith, Editor(s)

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