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Proceedings Paper

Development of fluoropolymers for pellicle in 157nm lithography
Author(s): Shinji Okada; Hiromasa Yamamoto; Ikuo Matsukura; Naoko Shirota; Yuichirou Ishibashi; Hironao Sasaki; Iwao Higashikawa; Wataru Wakamiya
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Paper Abstract

Fluoropolymers have been successfully utilized for pellicle manufacturing in 248 and 193nm lithography. Moreover, the pellicle using such fluoropolymers will make a large contribution to the development of 193nm immersion technology that is now expected as NGL for 65nm and 45nm node. On the other hand, 157nm lithography is also considered to be a desirable solution as a future manufacturing technique. However, no fluoropolymers show good laser durability to 157nm irradiation. This is one of major obstacles for implementing 157nm lithography. It follows that the purpose of this research is to find out a polymer that has outstanding durability, and would therefore promote wider use of the 157nm technology. Through this research, we had synthesized some kinds of fluoropolymer platform and investigated their durability. From the investigation, we have found several criteria to control their photo-induced degradation. Based upon these criteria, we have synthesized several new fluoropolymers and investigated their durability. As the result of these evaluations, these polymers showed good initial transmission as expected. Moreover, some polymers showed good mechanical durability when exposed to over 100J/cm2 irradiation. In addition, some new copolymers between monomer containing tert-hydrogen and perfluorinated monomer showed poor mechanical durability, however the polymers showed higher transparency during irradiation. To investigate these phenomena, we have analyzed these polymers using FT-IR and XPS. From these analyses, we estimate and propose possible degradation mechanism of these polymers.

Paper Details

Date Published: 12 May 2004
PDF: 9 pages
Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2004); doi: 10.1117/12.599311
Show Author Affiliations
Shinji Okada, Asahi-Glass Co., Ltd. (Japan)
Hiromasa Yamamoto, Asahi-Glass Co., Ltd. (Japan)
Ikuo Matsukura, Asahi-Glass Co., Ltd. (Japan)
Naoko Shirota, Asahi-Glass Co., Ltd. (Japan)
Yuichirou Ishibashi, Asahi-Glass Co., Ltd. (Japan)
Hironao Sasaki, Semiconductor Leading Edge Technologies, Inc. (Japan)
Iwao Higashikawa, Semiconductor Leading Edge Technologies, Inc. (Japan)
Wataru Wakamiya, Semiconductor Leading Edge Technologies, Inc. (Japan)


Published in SPIE Proceedings Vol. 5754:
Optical Microlithography XVIII
Bruce W. Smith, Editor(s)

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