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Proceedings Paper

Current status of 157-nm lithography using a full-field scanner
Author(s): Toshiyuki Ishimaru; Seiji Matsuura; Miyoshi Seki; Kiyoshi Fujii; Ryo Koizumi; Yuji Hakataya; Akihiko Moriya
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Paper Abstract

In July 2004, the third FPA-5800 FS1 157-nm full-field scanner, developed by Canon Inc., was shipped to Selete. The scanner has an exposure field of 22 x 26 mm with a five-times reduction ratio. The numerical aperture is 0.80, which is the highest among all 157-nm scanners. We are now investigating tool performance, illumination uniformity, and imaging performance under various exposure conditions. In this paper, we will report our findings, focusing on the applicability of 157-nm dry lithography for the half-pitch 65-nm-node. We have obtained a resolution limit of 55-nm line-and-space (L&S) patterns with an alternating phase shifting mask. This corresponds to a 0.28 k1 factor. The depth of focus for these patterns at lens-center was 0.30 μm. For an attenuating PSM (Att-PSM) with annular illumination, the resolution limit was 65-nm L&S, which corresponds to 0.33 k1. The line width uniformity of 65-nm L&S with an Att-PSM was 15.0 nm. The dense-hole resolution was 80 nm. However, lens flare had a considerable effect on resist profiles, viewed as a difference between dark and bright field patterns. In addition, with the application of gate etching processes, the fabrication of a 40-nm line/120-nm pitch gate pattern was achieved. Improvement in the line width roughness (8.3 nm) is needed and should be attainable.

Paper Details

Date Published: 12 May 2004
PDF: 9 pages
Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2004); doi: 10.1117/12.599300
Show Author Affiliations
Toshiyuki Ishimaru, Semiconductor Leading Edge Technologies, Inc. (Japan)
Seiji Matsuura, Semiconductor Leading Edge Technologies, Inc. (Japan)
Miyoshi Seki, Semiconductor Leading Edge Technologies, Inc. (Japan)
Kiyoshi Fujii, Semiconductor Leading Edge Technologies, Inc. (Japan)
Ryo Koizumi, Canon Inc. (Japan)
Yuji Hakataya, Canon Inc. (Japan)
Akihiko Moriya, Canon Inc. (Japan)


Published in SPIE Proceedings Vol. 5754:
Optical Microlithography XVIII
Bruce W. Smith, Editor(s)

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