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Proceedings Paper

Evaluation of tin-foil targets for debris mitigation in laser generated EUV source
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Paper Abstract

It is very effective for mass-limited tin-foil targets to adapt for the EUV source. Tin-foil targets in account of formation, size, and thickness have been developed for debris mitigation. The amount of ions from targets is 40 % decreased tin-foil targets of 1μm or 5μm thickness than tin-bulk targets. The ion velocity is one order of magnitude less than bulk targets. The EUV emission spectra of tin-foil are more narrowing than bulk targets. The targets supply for high repetition rate of 10 kHz is applied for a novel method. It is called "Punch-out" method. The flight of graphite foil that it is a test targets was succeed to observe by using a gated ICCD camera. The target velocity is achieved to be about 120 m/s. This value can be applied for targets supply with high repetition rate of 10 kHz.

Paper Details

Date Published: 6 May 2005
PDF: 7 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.599155
Show Author Affiliations
Michiteru Yamaura, Institute for Laser Technology (Japan)
Shigeaki Uchida, Institute for Laser Technology (Japan)
Susumu Takemoto, Kinki Univ. (Japan)
Yoshinori Shimada, Institute for Laser Technology (Japan)
Hiroaki Nishimura, Institute of Laser Engineering, Osaka Univ. (Japan)
Shinsuke Fujioka, Institute of Laser Engineering, Osaka Univ. (Japan)
Keiji Nagai, Institute of Laser Engineering, Osaka Univ. (Japan)
Takayoshi Norimatsu, Institute of Laser Engineering, Osaka Univ. (Japan)
Katsunobu Nishihara, Institute of Laser Engineering, Osaka Univ. (Japan)
Noriaki Miyanaga, Institute of Laser Engineering, Osaka Univ. (Japan)
Yasukazu Izawa, Institute of Laser Engineering, Osaka Univ. (Japan)
Chiyoe Yamanaka, Institute for Laser Technology (Japan)


Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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