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Proceedings Paper

What makes a coherence curve change?
Author(s): Stephen P. Renwick
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Paper Abstract

With use of OPC on the rise, lithographers have now added coherence behavior to their list of important concerns about an imaging tool. Previously, parameters like nested-to-isolated bias were important. Now, we need to think about the behavior of an entire coherence curve, which is a plot of printed linewidth versus pitch for a set of features at constant reticle linewidth. While the precise shape of a curve may not be especially important, the lithographer will want to know the tool-to-tool variation and whether the curve will change with time. That variation is affected by at least both lens aberrations and illuminator pupil fill, and potentially by other factors as well, like flare or optics contamination. We have made a systematic study of coherence sensitivity to a host of potential factors, and we will present a sensitivity analysis, identifying the big and the small drivers of coherence-curve behavior.

Paper Details

Date Published: 12 May 2004
PDF: 11 pages
Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2004); doi: 10.1117/12.598939
Show Author Affiliations
Stephen P. Renwick, Nikon Precision, Inc. (United States)


Published in SPIE Proceedings Vol. 5754:
Optical Microlithography XVIII
Bruce W. Smith, Editor(s)

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