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Proceedings Paper

OPC for customized asymmetrical illumination types
Author(s): Jens Hassmann; Thomas Muelders; Andreas Jahnke; Karin Kurth; Christof Bodendorf; Jörg Thiele
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Proc. SPIE 5754, Optical Microlithography XVIII, ; doi: 10.1117/12.598744
Show Author Affiliations
Jens Hassmann, Infineon Technologies AG (Germany)
Thomas Muelders, Infineon Technologies AG (Germany)
Andreas Jahnke, Infineon Technologies AG (Germany)
Karin Kurth, Infineon Technologies AG (Germany)
Christof Bodendorf, Infineon Technologies AG (Germany)
Jörg Thiele, Infineon Technologies AG (Germany)


Published in SPIE Proceedings Vol. 5754:
Optical Microlithography XVIII
Bruce W. Smith, Editor(s)

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