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Proceedings Paper

Nikon EPL tool: the latest development status and results
Author(s): Takaharu Miura; Shintaro Kawata; Kazunari Hada; Yukio Kakizaki; Masaya Miyazaki; Kazuaki Suzuki; Noriyuki Hirayanagi; Atsushi Yamada; Junji Ikeda; Takehisa Yahiro; Jin Udagawa; Hidekazu Takekoshi; Takaaki Umemoto; Yukiharu Ohkubo; Toshimasa Shimoda; Toru Tanida; Yoichi Watanabe; Kaoru Ohmori; Futoshi Mori; Shigeru Takemoto; Takeshi Yoshioka; Kenji Morita
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Paper Abstract

Electron Projection Lithography (EPL) is considered one of promising technologies below 45nm node, especially for contact/via holes and gate layers. EPL has some nice features such as very high resolution to be applied for two device nodes, large process margin associated with large depth of focus and an expected lower CoO. Nikon has been developing an EPL tool, so-called EB Stepper. NSR-EB1A is the first EB Stepper that was designed as R&D tool for 65nm technology node and that was already delivered for Selete (Semiconductor Leading Edge Technologies, Inc.) at Tsukuba in Japan. Nikon has developed two NSR-EB1A tools so far, one system for Selete as a 300mm wafer system and the other for Nikon's development and evaluation as a 200mm wafer system. Both tools have already started to show full performance data and good stability characteristics. The latest EB1A tool performance shows very good results in such data as the resolution of 50nm 2:1 L/S and 60nm 1:1 dense contact holes patterns, stitching accuracy of around 18nm, and overlay accuracy of around 20nm(X+3sigma).

Paper Details

Date Published: 6 May 2005
PDF: 6 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.598687
Show Author Affiliations
Takaharu Miura, Nikon Corp. (Japan)
Shintaro Kawata, Nikon Corp. (Japan)
Kazunari Hada, Nikon Corp. (Japan)
Yukio Kakizaki, Nikon Corp. (Japan)
Masaya Miyazaki, Nikon Corp. (Japan)
Kazuaki Suzuki, Nikon Corp. (Japan)
Noriyuki Hirayanagi, Nikon Corp. (Japan)
Atsushi Yamada, Nikon Corp. (Japan)
Junji Ikeda, Nikon Corp. (Japan)
Takehisa Yahiro, Nikon Corp. (Japan)
Jin Udagawa, Nikon Corp. (Japan)
Hidekazu Takekoshi, Nikon Corp. (Japan)
Takaaki Umemoto, Nikon Corp. (Japan)
Yukiharu Ohkubo, Nikon Corp. (Japan)
Toshimasa Shimoda, Nikon Corp. (Japan)
Toru Tanida, Nikon Corp. (Japan)
Yoichi Watanabe, Nikon Corp. (Japan)
Kaoru Ohmori, Nikon Corp. (Japan)
Futoshi Mori, Nikon Corp. (Japan)
Shigeru Takemoto, Nikon Corp. (Japan)
Takeshi Yoshioka, Nikon Corp. (Japan)
Kenji Morita, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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