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Proceedings Paper

Quantum image-forming theory beyond diffraction limit
Author(s): Naoki Fukutake
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Paper Abstract

We formulate an image-forming optical theory of quantum lithography in which Entangled-photon pairs generated by spontaneous parametric down-conversion play an important role. Our optical system consists of an image-forming system, an illumination system with a second-order nonlinear medium, and two-photon absorbing materials. We evaluate the resolution of the quantum lithography system by using the optical transfer function and show a super-resolving condition which is, however, difficult to achieve.

Paper Details

Date Published: 12 May 2005
PDF: 5 pages
Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); doi: 10.1117/12.598590
Show Author Affiliations
Naoki Fukutake, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 5754:
Optical Microlithography XVIII
Bruce W. Smith, Editor(s)

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