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Proceedings Paper

Erosion and degradation of EUV lithography collector mirrors under particle bombardment
Author(s): Jean P. Allain; Ahmed Hassanein; Martin Nieto; Vladimir Titov; Perry Plotkin; Edward Hinson; Bryan J. Rice; Robert Bristol; Daniel Rokusek; Wayne Lytle; Brent J. Heuser; Monica M. C. Allain; Hyunsu Ju; Christopher Chrobak
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Paper Abstract

In extreme ultraviolet lithography (EUVL) environments both laser produced plasma (LPP) and gas discharge produced plasma (GDPP) configurations face serious issues regarding components lifetime and performance under particle bombardment, in particular collector mirrors. For both configurations debris, fast ions, fast neutrals, and condensable EUV radiator fuels (Li, Sn) can affect collector mirrors. In addition, collector mirrors are exposed to impurities (H,C,O,N), off-band radiation (depositing heat) and highly-charged ions leading to their degradation and consequently limiting 13.5 nm light reflection intensity. The IMPACT (Interaction of Materials with charged Particles and Components Testing) experiment at Argonne studies radiation-induced, thermodynamic and kinetic mechanisms that affect the performance of optical mirror surfaces. Results of optical component interaction with singly-charged inert gases (Xe) and alternate radiators (e.g. Sn) are presented for glancing incidence mirrors (i.e., Ru, Pd) at bombarding energies between 100-1000 eV at room temperature. Measurements conducted include: In-situ surface analysis: Auger electron spectroscopy, X-ray photoelectron spectroscopy, direct recoil spectroscopy and low-energy ion scattering spectroscopy; Ex-situ surface analysis: X-ray reflectivity, X-ray diffraction, atomic force microscopy and at-wavelength EUV reflectivity (NIST-SURF).

Paper Details

Date Published: 6 May 2005
PDF: 8 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.598515
Show Author Affiliations
Jean P. Allain, Argonne National Lab. (United States)
Ahmed Hassanein, Argonne National Lab. (United States)
Martin Nieto, Argonne National Lab. (United States)
Vladimir Titov, Argonne National Lab. (United States)
Perry Plotkin, Argonne National Lab. (United States)
Edward Hinson, Argonne National Lab. (United States)
Bryan J. Rice, Intel Corp. (United States)
Robert Bristol, Intel Corp. (United States)
Daniel Rokusek, Univ. of Illinois at Urbana-Champaign (United States)
Wayne Lytle, Univ. of Illinois at Urbana-Champaign (United States)
Brent J. Heuser, Univ. of Illinois at Urbana-Champaign (United States)
Monica M. C. Allain, Univ. of Illinois at Urbana-Champaign (United States)
Hyunsu Ju, Univ. of Illinois at Urbana-Champaign (United States)
Christopher Chrobak, Univ. of Wisconsin/Madison (United States)

Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

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