Share Email Print
cover

Proceedings Paper

Ion beam imprinting system
Author(s): Ye Chen; Lili Ji; Bret P. van den Akker; Qing Ji; Ka-Ngo Leung; Wigbert J. Siekhaus
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

An ion beam imprinting system has been developed at Lawrence Berkeley National Laboratory recently. It is a useful tool to perform micromachining, surface modification, and ion doping etc. The principle of the imprinter is to directly transfer the pattern from the mask to the substrate. It is capable to produce multiple shaped ion beams simultaneously. Therefore it is much more efficient to do micromachining for large volume production than conversional focused ion beam system. Different shaped masks and diverse ion species have been tested both on conductors and insulators. Furthermore, the ion beam imprinter can transfer patterns not only onto a planar target but also onto non-planar surfaces, for example the outer and inner surfaces of cylinders. The imprinting technique can also be applied in three-dimensional micromachining, for example using cylindrical masks to fabricate the medical stents.

Paper Details

Date Published: 6 May 2005
PDF: 8 pages
Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); doi: 10.1117/12.598467
Show Author Affiliations
Ye Chen, Lawrence Berkeley National Lab. (United States)
Univ. of California/Berkeley (United States)
Lili Ji, Lawrence Berkeley National Lab. (United States)
Univ. of California/Berkeley (United States)
Bret P. van den Akker, Lawrence Berkeley National Lab. (United States)
San Francisco State Univ. (United States)
Qing Ji, Lawrence Berkeley National Lab. (United States)
Harvard Univ. (United States)
Ka-Ngo Leung, Lawrence Berkeley National Lab. (United States)
Univ. of California/Berkeley (United States)
Wigbert J. Siekhaus, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 5751:
Emerging Lithographic Technologies IX
R. Scott Mackay, Editor(s)

© SPIE. Terms of Use
Back to Top