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Proceedings Paper

Measurement of a phase-shifting mask with the Mirau correlation microscope
Author(s): Stanley S. C. Chim; Gordon S. Kino
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Paper Abstract

We describe here an interference microscope, the Mirau correlation microscope, for examining a phase-shifting mask used in lithography. The accuracy of the phase measurements obtained was +/- 2 degrees (or equivalently +/- nm in height variations) at 577 nm wavelength, with a transverse resolution of the order of 0.4 micrometers . A transmission phase- shifting mask was examined. The amplitude image showed the locations of the bright (transmitting) and dark (chromium) regions of the mask while the phase shifts introduced by the mask were revealed by the phase image. Mask defects in the chromium regions and phase shifting errors in the transmitting regions could thus be readily identified.

Paper Details

Date Published: 1 June 1992
PDF: 6 pages
Proc. SPIE 1673, Integrated Circuit Metrology, Inspection, and Process Control VI, (1 June 1992); doi: 10.1117/12.59845
Show Author Affiliations
Stanley S. C. Chim, Stanford Univ. (United States)
Gordon S. Kino, Stanford Univ. (United States)


Published in SPIE Proceedings Vol. 1673:
Integrated Circuit Metrology, Inspection, and Process Control VI
Michael T. Postek, Editor(s)

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