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Proceedings Paper

Positive-tone surface imaging: methodologies for analysis and process control
Author(s): Susan K. Jones; Peter Freeman; Edward K. Pavelchek; John F. Bohland; Bruce W. Dudley; Gary S. Calabrese
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Paper Abstract

A variety of analytical and process control techniques have been employed during process development activities for a 0.5 micrometers deep UV positive tone surface imaging process. Examples of applications of these methods for identification of primary positive tone surface imaging issues and process optimization for enhancement of ultimate resolution are described. Advantages and limitations for each technique are discussed.

Paper Details

Date Published: 1 June 1992
PDF: 12 pages
Proc. SPIE 1673, Integrated Circuit Metrology, Inspection, and Process Control VI, (1 June 1992); doi: 10.1117/12.59843
Show Author Affiliations
Susan K. Jones, Microelectronics Ctr. of North Carolina (United States)
Peter Freeman, Digital Equipment Corp. (United States)
Edward K. Pavelchek, Shipley Co., Inc. (United States)
John F. Bohland, Shipley Co., Inc. (United States)
Bruce W. Dudley, Microelectronics Ctr. of North Carolina (United States)
Gary S. Calabrese, Shipley Co., Inc. (United States)


Published in SPIE Proceedings Vol. 1673:
Integrated Circuit Metrology, Inspection, and Process Control VI
Michael T. Postek, Editor(s)

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