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Proceedings Paper

On board polarization measuring instrument for high NA excimer scanner
Author(s): Toru Fujii; Naonori Kita; Yasushi Mizuno
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Paper Abstract

We developed an instrument for monitoring the polarized illuminator of the ArF scanner. A rotatable retarder and a rotatable analyzer were incorporated in the instrument for polarimetry. The instrument measures polarization state of the polarized illuminator in sufficient accuracy. Stokes parameter of the illumination light incorporated in the ArF scanner was successfully obtained. The measured result showed that the polarization state of the illumination light was controlled well. The instrument is as small and light-weighted as can be installed on board.

Paper Details

Date Published: 10 May 2005
PDF: 7 pages
Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); doi: 10.1117/12.598378
Show Author Affiliations
Toru Fujii, Nikon Corp. (Japan)
Naonori Kita, Nikon Corp. (Japan)
Yasushi Mizuno, Nikon Corp. (Japan)


Published in SPIE Proceedings Vol. 5752:
Metrology, Inspection, and Process Control for Microlithography XIX
Richard M. Silver, Editor(s)

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