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Proceedings Paper

Measurement of multilayer film and reflectivity on wafers using ultraviolet-visible microspectrophotometry
Author(s): Warren Lin; Vincent J. Coates; Bhanwar Singh
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Paper Abstract

An ultraviolet (UV) microspectrophotometer, the NanoSpecTM/AFT 210UV, with a measuring spot size less than 10 microns, can make accurate measurements of SiO2 on polysilicon, and thin SiO2 on aluminum. Various materials are presented for comparison in both the UV and visible range.

Paper Details

Date Published: 1 June 1992
PDF: 2 pages
Proc. SPIE 1673, Integrated Circuit Metrology, Inspection, and Process Control VI, (1 June 1992); doi: 10.1117/12.59833
Show Author Affiliations
Warren Lin, Nanometrics Inc. (United States)
Vincent J. Coates, Nanometrics Inc. (United States)
Bhanwar Singh, Advanced Micro Devices, Inc. (United States)


Published in SPIE Proceedings Vol. 1673:
Integrated Circuit Metrology, Inspection, and Process Control VI
Michael T. Postek, Editor(s)

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