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Proceedings Paper

Etching error analysis of dot grating array in microlithography fabrication
Author(s): N. K. Bao; Z. Y. Chen
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Paper Abstract

This paper described the error effect in fabricating process of dot grating array using the Electro-Beam Lithography (EBL). These errors show the change in the width and depth of each pixel of binary optical element (BOE). It will directly induce the errors of the position and phase of transmission beam. The experimental simulating results are compared with that of the theoretical ones.

Paper Details

Date Published: 10 May 2005
PDF: 9 pages
Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); doi: 10.1117/12.598161
Show Author Affiliations
N. K. Bao, City Univ. of Hong Kong (Hong Kong China)
Z. Y. Chen, Shanghai Institute of Optics and Fine Mechanics, CAS (China)


Published in SPIE Proceedings Vol. 5752:
Metrology, Inspection, and Process Control for Microlithography XIX
Richard M. Silver, Editor(s)

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