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Proceedings Paper

Photoacoustic characterization of the mechanical properties of thin film materials
Author(s): Feifei Zhang; Sridhar Krishnaswamy; Dong Fei; Douglas A. Rebinsky
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Paper Abstract

Two high frequency photoacoustic techniques were applied to investigate the mechanical properties of two sets of thin film materials in this work. Broadband photoacoustic guided-wave method was used to measure the guided-wave phase velocity dispersion curves of nano-structured diamond-like carbon hard coatings. The experimental velocity spectra were analyzed by a nonlinear optimization approach in conjunction with a multi-layer wave-propagation model. The derived Young’s moduli using the broadband photoacoustic technique were compared with line-focus acoustic microscopy and nano-indentation tests and good quantitative agreement is found. In a second set of experiments, ultra-thin two-layer aluminum and silicon nitride thin film materials were tested using the femtosecond transient pump-probe method using high frequency bulk waves generated by the ultra-fast laser pulses. The measured moduli of silicon nitride thin layers are in the range of 270 - 340 GPa. Photoacoustic methods are shown to be suitable for in-situ and non-destructive evaluation of the mechanical properties of thin films.

Paper Details

Date Published: 9 May 2005
PDF: 10 pages
Proc. SPIE 5766, Testing, Reliability, and Application of Micro- and Nano-Material Systems III, (9 May 2005); doi: 10.1117/12.598028
Show Author Affiliations
Feifei Zhang, Northwestern Univ. (United States)
Sridhar Krishnaswamy, Northwestern Univ. (United States)
Dong Fei, Caterpillar Inc. (United States)
Douglas A. Rebinsky, Caterpillar Inc. (United States)


Published in SPIE Proceedings Vol. 5766:
Testing, Reliability, and Application of Micro- and Nano-Material Systems III
Robert E. Geer; Norbert Meyendorf; George Y. Baaklini; Bernd Michel, Editor(s)

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