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Proceedings Paper

Numerical reference models for optical metrology simulation
Author(s): Gregory L. Wojcik; John Mould; Egon Marx; Mark P. Davidson
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Paper Abstract

Optical modeling on the computer can aid R&D efforts to enhance metrology methods, and similarly for lithography, alignment, and particulate monitoring. However, full exploitation of optical modeling is hindered by the lack of appropriate benchmarks for verifying algorithms and evaluating approximations. To help remedy this situation we describe a preliminary set of scalar, 2-D numerical reference models (NRMs). These include isolated thin and thick lines, periodic lines, and an isolated trench. Scattered fields are compared for three different solution methods, based on time-domain finite elements, boundary integrals, and a waveguide model. Correlation is good in general, although important differences are seen in both code accuracy and performance. NRM generalizations are suggested that accommodate 3-D effects, imaging, and experimental verification.

Paper Details

Date Published: 1 June 1992
PDF: 13 pages
Proc. SPIE 1673, Integrated Circuit Metrology, Inspection, and Process Control VI, (1 June 1992); doi: 10.1117/12.59785
Show Author Affiliations
Gregory L. Wojcik, Weidlinger Associates, Inc. (United States)
John Mould, Weidlinger Associates, Inc. (United States)
Egon Marx, National Institute of Standards and Technology (United States)
Mark P. Davidson, Spectel Co. (United States)

Published in SPIE Proceedings Vol. 1673:
Integrated Circuit Metrology, Inspection, and Process Control VI
Michael T. Postek, Editor(s)

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