Share Email Print
cover

Proceedings Paper

Scanning electron microscope system for linewidth measurement of IC
Author(s): Cheon Il Eom; TaeBong Eom; Yeong-Uk Ko; Myung-Sai Chung
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Two methods of measuring the linewidth of IC using a scanning electron microscope (SEM) have been studied. In the first method, the electron beam was digitally scanned by D/A converters and the signal intensity of secondary electrons obtained by an A/D converter was analyzed by image processing technique to determine the linewidth. This method was found to be very simple and fast, but it was necessary to have a standard specimen to calibrate the magnification of the SEM. Moreover, the distortion of the electron optics induced additional errors in the linewidth measurement. In the second method, the electron beam was fixed and the specimen was set on a precise scanning stage driven by a piezoelectric transducer. The linewidth of the specimen has been determined from the signal intensity of the secondary electron and the displacement of the stage measured by a laser interferometer. This method was used to calibrate the linewidth of the standard specimen. For this study, a system which can be used to measure the linewidth by either of the two methods has been developed. The Monte Carlo simulation was also carried out to obtain the intensities of secondary and backscattered electrons. The results of the measurements and the simulation are discussed.

Paper Details

Date Published: 1 June 1992
PDF: 6 pages
Proc. SPIE 1673, Integrated Circuit Metrology, Inspection, and Process Control VI, (1 June 1992); doi: 10.1117/12.59784
Show Author Affiliations
Cheon Il Eom, Korea Research Institute of Standards and Science (South Korea)
TaeBong Eom, Korea Research Institute of Standards and Science (South Korea)
Yeong-Uk Ko, Korea Research Institute of Standards and Science (South Korea)
Myung-Sai Chung, Korea Research Institute of Standards and Science (South Korea)


Published in SPIE Proceedings Vol. 1673:
Integrated Circuit Metrology, Inspection, and Process Control VI
Michael T. Postek, Editor(s)

© SPIE. Terms of Use
Back to Top