Share Email Print
cover

Proceedings Paper

Diazonaphthoquinone-sensitized deep-UV resist materials
Author(s): Seiki Fukunaga; Tomoyuki Kitaori; Hiroo Koyanagi; Shin'ichi Umeda; Kohtaro Nagasawa
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

This paper describes novel diazonaphthoquinone-sensitized deep UV resist materials and a process for improving the pattern profile thereof; namely, incorporation of an alkaline treatment subsequent to the exposure in the processing.

Paper Details

Date Published: 1 June 1992
PDF: 13 pages
Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); doi: 10.1117/12.59775
Show Author Affiliations
Seiki Fukunaga, Nippon Kayaku Co., Ltd. (Japan)
Tomoyuki Kitaori, Nippon Kayaku Co., Ltd. (Japan)
Hiroo Koyanagi, Nippon Kayaku Co., Ltd. (Japan)
Shin'ichi Umeda, Nippon Kayaku Co., Ltd. (Japan)
Kohtaro Nagasawa, Nippon Kayaku Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 1672:
Advances in Resist Technology and Processing IX
Anthony E. Novembre, Editor(s)

© SPIE. Terms of Use
Back to Top