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Proceedings Paper

Three-dimensional rigorous simulation of mask-induced polarization
Author(s): Xiuhong Wei; H. P. Urbach; Arthur Wachters; Yuri Aksenov
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Paper Abstract

The polarization induced by the mask is studied by using a 3D rigorous model, which solves Maxwell equations using the finite element method. The aerial image depends strongly on the change of polarization induced by the materials, thickness of the layer and pitch of the periodic masks.

Paper Details

Date Published: 12 May 2004
PDF: 9 pages
Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2004); doi: 10.1117/12.597732
Show Author Affiliations
Xiuhong Wei, Delft Univ. of Technology (Netherlands)
H. P. Urbach, Philips Research Labs. (Netherlands)
Arthur Wachters, Philips Research Labs. (Netherlands)
Yuri Aksenov, Philips Research Leuven (Belgium)


Published in SPIE Proceedings Vol. 5754:
Optical Microlithography XVIII
Bruce W. Smith, Editor(s)

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