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Proceedings Paper

Charge transfer approach to negative resists
Author(s): Reinhard R. Baumann; Joachim Bargon
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Paper Abstract

Three-dimensional lithographic patterns can be obtained using a new two component UV sensitive polymer system. The light-sensitive material consists of a chlorine containing conventional polymer, i.e., poly(chloroacrylonitrile) as a typical acceptor, and a heterocyclic or aromatic monomer as the donor, here pyrrole. This two component precomposite can be irradiated by either an excimer laser or the radiation of a high pressure mercury lamp. The resulting image, essentially a black and white pattern, can be developed in wet or dry (ion etching, ablation) modes giving resist patterns with a resolution in the micrometer range.

Paper Details

Date Published: 1 June 1992
PDF: 5 pages
Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); doi: 10.1117/12.59771
Show Author Affiliations
Reinhard R. Baumann, Univ. of Bonn and Technische Hochschule Leipzig (Germany)
Joachim Bargon, Univ. of Bonn (Germany)


Published in SPIE Proceedings Vol. 1672:
Advances in Resist Technology and Processing IX
Anthony E. Novembre, Editor(s)

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