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Proceedings Paper

Prewarping techniques in imaging: applications in nanotechnology and biotechnology
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Paper Abstract

In all imaging systems, the underlying process introduces undesirable distortions that cause the output signal to be a warped version of the input. When the input to such systems can be controlled, pre-warping techniques can be employed which consist of systematically modifying the input such that it cancels out (or compensates for) the process losses. In this paper, we focus on the mask (reticle) design problem for 'optical micro-lithography', a process similar to photographic printing used for transferring binary circuit patterns onto silicon wafers. We use a pixel-based mask representation and model the above process as a cascade of convolution (aerial image formation) and thresholding (high-contrast recording) operations. The pre-distorted mask is obtained by minimizing the norm of the difference between the 'desired' output image and the 'reproduced' output image. We employ the regularization framework to ensure that the resulting masks are close-to-binary as well as simple and easy to fabricate. Finally, we provide insight into two additional applications of pre-warping techniques. First is 'e-beam lithography', used for fabricating nano-scale structures, and second is 'electronic visual prosthesis' which aims at providing limited vision to the blind by using a prosthetic retinally implanted chip capable of electrically stimulating the retinal neuron cells.

Paper Details

Date Published: 11 March 2005
PDF: 14 pages
Proc. SPIE 5674, Computational Imaging III, (11 March 2005); doi: 10.1117/12.597694
Show Author Affiliations
Amyn Poonawala, Univ. of California/Santa Cruz (United States)
Peyman Milanfar, Univ. of California/Santa Cruz (United States)

Published in SPIE Proceedings Vol. 5674:
Computational Imaging III
Charles A. Bouman; Eric L. Miller, Editor(s)

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