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Proceedings Paper

Photonic systems formed by proximity field nanopatterning
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Paper Abstract

High resolution, conformable phase masks provide a means to fabricate, in an experimentally simple manner, classes of three dimensional (3D) nanostructures that are technologically important but difficult to generate in other ways. This proposed approach can answer the greatest challenge of photonic system; a simple and reliable fabrication method of periodic and aperiodic structure. Those unique advantages of proximity field nanopatterning originated from direct conformal contact and a further application to multi-photon process, and a representative waveguiding structure are investigated. The patterning capability in a broad range of wavelengths (from UV to near-IR) and unusual structures place this method as a key technique for photonic system.

Paper Details

Date Published: 22 January 2005
PDF: 9 pages
Proc. SPIE 5720, Micromachining Technology for Micro-Optics and Nano-Optics III, (22 January 2005); doi: 10.1117/12.597652
Show Author Affiliations
Seokwoo Jeon, Univ. of Illinois/Urbana-Champaign (United States)
Gary P. Wiederrecht, Argonne National Lab. (United States)
John A. Rogers, Univ. of Illinois/Urbana-Champaign (United States)

Published in SPIE Proceedings Vol. 5720:
Micromachining Technology for Micro-Optics and Nano-Optics III
Eric G. Johnson; Gregory P. Nordin; Thomas J. Suleski, Editor(s)

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