Share Email Print
cover

Proceedings Paper

Automatic bake plate calibration
Author(s): Paul MacDonald
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

In this paper, we introduce MaskTempTM, a novel wireless metrology system to record in-situ the temperature of a reticle during processing. In combination with OnWafer Technologies' AutoCal bake plate optimization software, MaskTemp provides a quick and easy method to fingerprint and optimize the within-plate temperature uniformity of advanced PEB plates.Thermal data is collected across multiple bake plates, and we show substantial within-plate and plate-to-plate improvements in advanced multi-zone hot plates calibrated with conventional methods.

Paper Details

Date Published: 6 December 2004
PDF: 8 pages
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.597638
Show Author Affiliations
Paul MacDonald, OnWafer Technologies, Inc. (United States)


Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

© SPIE. Terms of Use
Back to Top