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Proceedings Paper

Structural effects of NQD PAC and novolak resin on resist performance
Author(s): Hiroaki Nemoto; Katsumi Inomata; Toshiyuki Ota; Yoshiji Yumoto; Takao Miura; Hitoshi Chawanya
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Paper Abstract

The naphthoquinonediazide (NQD) proximity and the hydrophobicity of a variety of trifunctional NQD-PACs (photoactive compounds) were quantified and the relationship between them and some resist dissolution characteristics was investigated. The influence of novolak resin structure on the relationship was also examined. The average distances (L) between the NQD groups in PAC molecules were estimated by means of a MO calculation, and the retention time (RT) in HPLC measurement was used as a measure of the hydrophobicity of the PAC. A new index, LxRT, was found to be linearly correlated to the dissolution inhibition. The linear relationship indicates that the NQD proximity and the hydrophobicity are dominant factors for the dissolution inhibition among many PAC structural factors. A kinetic study for the dissolution of the samples containing an NQD-PAC or some model inhibitors having no NQD moiety strongly suggested the participation of an alkaline catalyzed coupling reaction between the resin and the PAC in the inhibition mechanism. Based on the above findings, a new comprehensive dissolution mechanism is proposed and the molecular design for a high performance resist is discussed.

Paper Details

Date Published: 1 June 1992
PDF: 12 pages
Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); doi: 10.1117/12.59761
Show Author Affiliations
Hiroaki Nemoto, Japan Synthetic Rubber Co., Ltd. (Japan)
Katsumi Inomata, Japan Synthetic Rubber Co., Ltd. (Japan)
Toshiyuki Ota, Japan Synthetic Rubber Co., Ltd. (Japan)
Yoshiji Yumoto, Japan Synthetic Rubber Co., Ltd. (Japan)
Takao Miura, Japan Synthetic Rubber Co., Ltd. (Japan)
Hitoshi Chawanya, Japan Synthetic Rubber Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 1672:
Advances in Resist Technology and Processing IX
Anthony E. Novembre, Editor(s)

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