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Proceedings Paper

Studies of dissolution inhibition mechanism of DNQ novolak resists: part III--secondary inhibition with quaternary ammonium salts in development process
Author(s): Kenji Honda; Bernard T. Beauchemin; Rodney J. Hurditch; Andrew J. Blakeney; Tadayoshi Kokubo
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Paper Abstract

The dissolution behavior of films comprising novolak polymers and oligomers having defined structural characteristics has been investigated by means of near-real-time UV and FT-IR spectroscopic measurements. The observed results are correlated with the behavior of practical resists and the solution chemistry of related model compounds in order to provide a better understanding of the mechanism of dissolution inhibition with emphasis on `secondary' reactions occurring during the development process. In particular, evidence is presented for the formation of a stable TMA+/novolate- complex which may influence the dissolution inhibition dependency of the novolak microstructure.

Paper Details

Date Published: 1 June 1992
PDF: 8 pages
Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); doi: 10.1117/12.59760
Show Author Affiliations
Kenji Honda, OCG Microelectronic Materials, Inc. (United States)
Bernard T. Beauchemin, OCG Microelectronic Materials, Inc. (United States)
Rodney J. Hurditch, OCG Microelectronic Materials, Inc. (United States)
Andrew J. Blakeney, OCG Microelectronic Materials, Inc. (United States)
Tadayoshi Kokubo, Fuji Photo Film Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 1672:
Advances in Resist Technology and Processing IX
Anthony E. Novembre, Editor(s)

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