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Proceedings Paper

Experimental investigation of a novel dissolution model
Author(s): Medhat A. Toukhy; Steven G. Hansen; Rodney J. Hurditch; Chris A. Mack
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Paper Abstract

Mack recently proposed a new kinetically based 5-parameter model for positive photoresist bulk dissolution. The present work tests its physical assumptions by comparing its predictions with DRM measurements of seven different PAC/novolak formulations, each at several different PAC loadings. Although substantial qualitative agreement between the predictions and experiments is seen, quantitative agreement is poor. The most likely explanations for the quantitative difficulties are: (1) the assumptions that inhibition by the PAC and enhancement by the photo-acid can be treated independently and multiplicatively, apparently fail, (2) side reactions and intermediates are neglected by the model, and (3) complex PAC isomeric distributions and associated complex inhibition/enhancement effects are also neglected. The dissolution rate equation derived by the model does exhibit excellent flexibility in fitting actual bulk dissolution rate curves. This reason alone is sufficient to recommend its inclusion in commonly used simulation programs such as PROLITH/2 and SAMPLE. the present work shows that significant errors can result in simulations by using simple dissolution rate equation which are unable to accurately describe observed bulk dissolution data.

Paper Details

Date Published: 1 June 1992
PDF: 11 pages
Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); doi: 10.1117/12.59759
Show Author Affiliations
Medhat A. Toukhy, OCG Microelectronic Materials, Inc. (United States)
Steven G. Hansen, OCG Microelectronic Materials, Inc. (United States)
Rodney J. Hurditch, OCG Microelectronic Materials, Inc. (United States)
Chris A. Mack, FINLE Technologies (United States)

Published in SPIE Proceedings Vol. 1672:
Advances in Resist Technology and Processing IX
Anthony E. Novembre, Editor(s)

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