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Proceedings Paper

New positive-acting chemically amplified resist system for electron-beam lithography
Author(s): Hiroo Koyanagi; Shin'ichi Umeda; Seiki Fukunaga; Tomoyuki Kitaori; Kohtaro Nagasawa
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Paper Abstract

This paper is related to a three component chemically amplified positive-acting resist system for electron-beam lithography. The present resist system consists of an acid generator, novolak matrix, and dissolution inhibitor. The novelty of the resist system lies in the dissolution inhibitor; namely, tert.-butoxycarbonyl blocked o-cresolphthalein. The dissolution inhibitor converts into an effectual dissolution promoter by processing after irradiation, while it possesses a high dissolution inhibition capability. This attribute of the dissolution inhibitor resulted in a much improved pattern profile.

Paper Details

Date Published: 1 June 1992
PDF: 16 pages
Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); doi: 10.1117/12.59754
Show Author Affiliations
Hiroo Koyanagi, Nippon Kayaku Co., Ltd. (Japan)
Shin'ichi Umeda, Nippon Kayaku Co., Ltd. (Japan)
Seiki Fukunaga, Nippon Kayaku Co., Ltd. (Japan)
Tomoyuki Kitaori, Nippon Kayaku Co., Ltd. (Japan)
Kohtaro Nagasawa, Nippon Kayaku Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 1672:
Advances in Resist Technology and Processing IX
Anthony E. Novembre, Editor(s)

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