Share Email Print

Proceedings Paper

Hexafluoroacetone in resist chemistry: a versatile new concept for materials for deep-UV lithography
Author(s): Klaus Juergen Przybilla; Horst Roeschert; Georg Pawlowski
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Starting from general arguments on hexafluoroacetone chemistry, an exploratory investigation of the utility of this new type of resist chemistry is presented. The 2- hydroxyhexafluoroisopropyl-group (HHFIP) proves to be comparable to phenolic groups in respect to acidity and reactivity. Polymers containing HHFIP-moieties are high transparent alkali-soluble binder materials for functional group deprotection type, dissolution inhibition type, and crosslinking type photo resist materials. Dissolution inhibitors containing the HHFIP-function show superior inhibition properties due to strong hydrogen bond interaction with the matrix polymer.

Paper Details

Date Published: 1 June 1992
PDF: 13 pages
Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); doi: 10.1117/12.59744
Show Author Affiliations
Klaus Juergen Przybilla, Hoechst AG (Germany)
Horst Roeschert, Hoechst AG (Germany)
Georg Pawlowski, Hoechst AG (Germany)

Published in SPIE Proceedings Vol. 1672:
Advances in Resist Technology and Processing IX
Anthony E. Novembre, Editor(s)

© SPIE. Terms of Use
Back to Top