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Proceedings Paper

Hexafluoroacetone in resist chemistry: a versatile new concept for materials for deep-UV lithography
Author(s): Klaus Juergen Przybilla; Horst Roeschert; Georg Pawlowski
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Paper Abstract

Starting from general arguments on hexafluoroacetone chemistry, an exploratory investigation of the utility of this new type of resist chemistry is presented. The 2- hydroxyhexafluoroisopropyl-group (HHFIP) proves to be comparable to phenolic groups in respect to acidity and reactivity. Polymers containing HHFIP-moieties are high transparent alkali-soluble binder materials for functional group deprotection type, dissolution inhibition type, and crosslinking type photo resist materials. Dissolution inhibitors containing the HHFIP-function show superior inhibition properties due to strong hydrogen bond interaction with the matrix polymer.

Paper Details

Date Published: 1 June 1992
PDF: 13 pages
Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); doi: 10.1117/12.59744
Show Author Affiliations
Klaus Juergen Przybilla, Hoechst AG (Germany)
Horst Roeschert, Hoechst AG (Germany)
Georg Pawlowski, Hoechst AG (Germany)


Published in SPIE Proceedings Vol. 1672:
Advances in Resist Technology and Processing IX
Anthony E. Novembre, Editor(s)

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