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Proceedings Paper

Diagnostics for laser plasma EUV sources
Author(s): Martin C. Richardson; Chiew-Seng Koay; Kazutoshi Takenoshita; C. Keyser; Robert Bernath; Simi George; Somsak Teerawattanasook
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Paper Abstract

A high repetition-rate laser plasma source, possessing distinct radiation and particle emission characteristics, is now a principal candidate light source for the next generation of technology for the fabrication of computer chips. For these sources to satisfy this critical need they will need to meet unprecedented levels of performance, stability and lifetime. We review here some of the principal diagnostics of the EUV radiation that are now being utilized in the metrology, spectroscopy and imaging of these sources.

Paper Details

Date Published: 17 March 2005
PDF: 9 pages
Proc. SPIE 5580, 26th International Congress on High-Speed Photography and Photonics, (17 March 2005); doi: 10.1117/12.597349
Show Author Affiliations
Martin C. Richardson, College of Optics and Photonics/Univ. of Central Florida (United States)
Chiew-Seng Koay, College of Optics and Photonics/Univ. of Central Florida (United States)
Kazutoshi Takenoshita, College of Optics and Photonics/Univ. of Central Florida (United States)
C. Keyser, College of Optics and Photonics/Univ. of Central Florida (United States)
Robert Bernath, College of Optics and Photonics/Univ. of Central Florida (United States)
Simi George, College of Optics and Photonics/Univ. of Central Florida (United States)
Somsak Teerawattanasook, College of Optics and Photonics/Univ. of Central Florida (United States)


Published in SPIE Proceedings Vol. 5580:
26th International Congress on High-Speed Photography and Photonics
Dennis L. Paisley; Stuart Kleinfelder; Donald R. Snyder; Brian J. Thompson, Editor(s)

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