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Proceedings Paper

Influence of sensitizer spatial distribution on the dissolution mechanism in diazonaphthoquinone resists
Author(s): Veena Rao; William D. Hinsberg; Curtis W. Frank; Roger Fabian W. Pease
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Paper Abstract

The inhibition mechanism in diazonaphthoquinone positive resists has been widely studied. The ability of the photoactive compound to retard the dissolution of the matrix resin has been attributed to both chemical interactions between resist components as well as spatial distribution of sensitizer in a resist film. Our work has focused on understanding the physical distribution of the photoactive compound on the development behavior of this class of positive resists. We have used Langmuir-Blodgett deposition to fabricate resist structures with highly stratified sensitizer distributions. Dissolution measurements using a quartz crystal microbalance have demonstrated that preferential placement of very thin layers of sensitizer both at the surface of a resist film and embedded between two layers of polymeric resin can significantly affect development.

Paper Details

Date Published: 1 June 1992
PDF: 17 pages
Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); doi: 10.1117/12.59732
Show Author Affiliations
Veena Rao, Stanford Univ. (United States)
William D. Hinsberg, IBM Almaden Research Ctr. (United States)
Curtis W. Frank, Stanford Univ. (United States)
Roger Fabian W. Pease, Stanford Univ. (United States)


Published in SPIE Proceedings Vol. 1672:
Advances in Resist Technology and Processing IX
Anthony E. Novembre, Editor(s)

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