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Proceedings Paper

Tert-Butoxycarbonylated novolac resins as chemically amplified imaging materials
Author(s): Antoni S. Gozdz; John A. Shelburne
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Paper Abstract

A sensitive, dual-tone, chemically amplified deep-UV and electron-beam resist system has been studied. The resist is composed of tert-butoxycarbonylated novolac (tBOC-N) and a photoacid generator (PAG). Preferably, the matrix polymer is synthesized from novolacs, from which the low molecular weight fraction has been removed by fractionation or extraction. The polymer is highly transparent at (lambda) > 240 nm (OD approximately equals 0.15/micrometers ) and is thermally stable up to ca. 170 - 180 degree(s)C. While the deblocked polymer remains insoluble in aqueous bases, it can be developed in lower alcohols. The dual- tone resist exhibits sensitivity of < 5 mJ/cm2 at 254 nm and < 3 (mu) C/cm2 at 50 kV. Very high resolution, negative-tone structures were defined in this resist by electron- beam lithography.

Paper Details

Date Published: 1 June 1992
PDF: 10 pages
Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); doi: 10.1117/12.59729
Show Author Affiliations
Antoni S. Gozdz, Bell Communications Research (United States)
John A. Shelburne, Bell Communications Research (United States)

Published in SPIE Proceedings Vol. 1672:
Advances in Resist Technology and Processing IX
Anthony E. Novembre, Editor(s)

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